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Izifundo ze-AI

Chaza ukuthi kungani i-EUV ilahlekelwa ukukhanya ekubonisweni ngakunye, bese ulandelela ama-oda e-diffraction: imaski → ama-facet array amabili → i-wafer. Sebenzisa imidwebo yephepha ukuchaza izindlela zokukhanya ezilinganayo, ama-coating nomklamo we-inverse mask. Bonisa ukunciphisa ngo-4×, i-NA efi

Chaza ukuthi kungani i-EUV ilahlekelwa ukukhanya ekubonisweni ngakunye, bese ulandelela i-d

I-EUV ilahlekelwa ukukhanya ekubonisweni ngakunye; ama-oda e-diffraction asuka kumaski adlule kuma-facet array amabili aye ku-wafer.

Umyalelo

Chaza ukuthi kungani i-EUV ilahlekelwa ukukhanya ekubonisweni ngakunye, bese ulandelela ama-oda e-diffraction: imaski → ama-facet array amabili → i-wafer. Sebenzisa imidwebo yephepha ukuchaza izindlela zokukhanya ezilinganayo, ama-coating nomklamo we-inverse mask. Bonisa ukunciphisa ngo-4×, i-NA efika ku-0.993 namaphuzu alingisiwe e-FWHM angu-5.4 nm. Cacisa ukuthi u-50–60% ukudluliswa kwe-oda okwamukelwayo, hhayi ukusebenza kahle kweskena; umklamo we-3D unama-facet angu-2,256. Phetha ngemikhawulo yamaphethini aphindaphindwayo, ukuqondanisa, i-coherence nokuphrinta kwe-resist okungakahlolwa. Sebenzisa isiNgisi esilula, chaza amagama futhi ugweme ihaba.